CF4 Glow Discharge Modification of CH4 Plasma Polymer Layers Deposited onto Asymmetric Polysulfone Gas Separation Membranes
CF4 Glow Discharge Modification of CH4 Plasma Polymer Layers Deposited onto Asymmetric Polysulfone Gas Separation Membranes
复制标题
沉积在不对称聚砜气体分离膜上的 CH4 等离子体聚合物层的 CF4 辉光放电改性
作者：
J. Hopkins;J. Badyal
用XPS、FTIR、AFM和气体渗透性测试研究了甲烷等离子体聚合物层在非对称聚砜膜上的CF{sub 4}辉光放电后改性。氧气和氮气的渗透性和透过聚砜基板的选择性被发现是强烈的等离子体处理参数的影响。参考文献52篇，图7。
Post CF{sub 4} glow discharge modification of methane plasma polymer layers deposited onto asymmetric polysulfone membranes has been investigated by XPS, FTIR, AFM, and gas permeability measurements. Oxygen and nitrogen gas permeability and permselectivity through the polysulfone substrate are found to be strongly influenced by the plasma processing parameters. 52 refs., 7 figs.