Effect of laser fluence on the deposition and hardnessof boron carbide thin films
Effect of laser fluence on the deposition and hardnessof boron carbide thin films
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DOI：
10.1007/s003390100954
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发表时间：
2002-04
期刊：
影响因子：
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通讯作者：
F. Kokai;M. Taniwaki;M. Ishihara;Yoshinori Koga
中科院分区：
文献类型：
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作者：
F. Kokai;M. Taniwaki;M. Ishihara;Yoshinori Koga
我们在室温下使用 B4C 靶材通过脉冲激光沉积沉积了非晶碳化硼薄膜。随着激光能量密度从 1 J/cm2 增加到 3 J/cm2，嵌入薄膜中的 0.25-5 μm 颗粒数量减少，薄膜的 B/C 原子比从 1.8 增加到 3.2。取决于激光注量的熔滴、原子和小分子物质的到达似乎参与了薄膜的形成。此外，随着注量的增加，薄膜的纳米压痕硬度从 14 GPa 增加到 32 GPa。我们认为，观察到的薄膜硬度增加的主导因素是高能离子和原子的到来，导致形成更致密的薄膜。
We deposited amorphous thin films of boron carbide by pulsed laser deposition using a B4C target at room temperature. As the laser fluence increased from 1 to 3 J/cm2, the number of 0.25–5 μm particulates embedded in the films decreased, and the B/C atomic ratio of the films increased from 1.8 to 3.2. The arrival of melt droplets, atoms, and small molecular species depending on laser fluence appeared to be involved in the film formation. In addition, with increasing fluence the nanoindentation hardness of the films increased from 14 to 32 GPa. We believe that the dominant factor in the observed increase in the films’ hardness is the arrival of highly energetic ions and atoms that results in the formation of denser films.