A Novel Optimization Method for Parametric Yield: Uniform Design Mapping Distance Algorithm
A Novel Optimization Method for Parametric Yield: Uniform Design Mapping Distance Algorithm
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DOI：
10.1109/tcad.2006.885833
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发表时间：
2007-06
影响因子：
2.9
通讯作者：
Ming E Jing;Y. Hao;Dian Zhou;Xuan Zeng
中科院分区：
文献类型：
--
作者：
Ming E Jing;Y. Hao;Dian Zhou;Xuan Zeng
本文提出了一种用于 IC 参数良率优化的新算法 UDMDA。该算法集成了均匀设计（UD）和映射距离。 UD 中提出了一种有效而简单的点集均匀性测量方法，即 k 最近邻。与现有方法相比，该算法不需要任何梯度计算和初始点假设。此外，该算法具有较高的收敛速度，且对电路规模不敏感。因此，它可以用来优化标称性能并提高参数良率。通过两个电路示例说明了该算法的效率
A novel algorithm UDMDA for parametric yield optimization of IC is proposed in this paper. The algorithm integrates uniform design (UD) and mapping distance. An effective yet simple measurement of uniformity of a set of points, namely k-nearest neighbor, is suggested in the UD. Compared with the available methods, the proposed algorithm does not need any calculation of gradient and assumption of initial point. Furthermore, this algorithm has a high convergence rate and is not sensitive to the size of circuit. Therefore, it can be utilized to optimize the nominal performance as well as improve parametric yield. The efficiency of this algorithm is illustrated with two circuit examples