Spreading and solidification behavior of molten Si droplets impinging on substrates
Spreading and solidification behavior of molten Si droplets impinging on substrates
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DOI:
10.1016/j.actamat.2004.07.039
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发表时间:
2004-10
期刊:
影响因子:
9.4
通讯作者:
K. Nagashio;H. Murata;K. Kuribayashi
中科院分区:
文献类型:
--
作者:
K. Nagashio;H. Murata;K. Kuribayashi
This paper focuses on an effect of initial undercoolings on the spreading and solidification behavior of Si dropped on a silicon wafer, which was directly observed through it by the infrared imaging system. For an overheated droplet, the melt spreading occurred first and solidified later. The final splat shape was a typical disc. On the other hand, for a droplet with large initial undercooling, the solidification took place at the faster rate than the melt spreading, which resulted in a spherical shape of final splat. It is indicated that the final shape is considerably affected by the initial undercooling in the measurable-scale experiment with large droplets (∼mm size) and low impingement rates (∼m/s order). Moreover, equiaxed grains were found throughout the quenched surface by an electron backscatter pattern analysis. That is, the microstructure formation was nucleation-controlled since the growth parallel to the substrate was suppressed by the time-dependent contact of melt/substrate governed by the melt deformation.