The influence of ion beam sputtering geometry on metastable (Ni81Fe19)O/Ni81Fe19 exchange biased bilayers

The influence of ion beam sputtering geometry on metastable (Ni81Fe19)O/Ni81Fe19 exchange biased bilayers
复制标题

离子束溅射几何结构对亚稳态 (Ni81Fe19)O/Ni81Fe19 交换偏置双层的影响

DOI:
10.1016/j.jallcom.2003.09.088
复制
发表时间:
2004
影响因子:
6.2
通讯作者:
Carlos F. Gutierrez
Carlos F. Gutierrez
中科院分区:
材料科学2区
文献类型:
--
作者:
A. Bandyopadhyay;S. Rios;Albert Tijerina;Carlos F. Gutierrez

文献摘要

被引文献

相似文献

用反应双离子束溅射法制备了NiO型岩盐晶相的坡莫合金(Ni_(81)Fe_(19))O或PyO亚稳多晶薄膜。采用高角X射线衍射(HAXRD)、X射线反射率(XRR)和振动样品磁强计(VSM)对材料进行了表征。研究了厚度为30 ~ 100 nm的坡莫合金氧化物薄膜。发现这些亚稳氧化物膜的结晶和磁性取决于(1)离子束靶溅射源、靶和衬底的镜面相对于非镜面RDIBS几何位置的选择;(2)Ar+(较轻)或Kr+(较重)溅射离子的使用;以及(3)溅射期间衬底温度的选择。此外,还观察到在静态磁性膜中使用适度的500 K沉积后真空退火,以极大地改善交换偏置PyO/Py双层结构(Py= Ni_(81)Fe_(19))的磁性。当最佳处理时,RDIBS制造的坡莫合金一氧化物膜可用于制造交换偏置的PyO/Py双层,其具有比先前在等效磁控溅射的PyO/Py或类似的离子束溅射的NiO/Py双层样品中发现的改进的介电特性。
Metastable polycrystalline permalloy monoxide films (Ni81Fe19)O or PyO, with NiO-type rocksalt crystalline have been fabricated by reactive dual ion beam sputtering (RDIBS). These materials were characterized with high angle X-ray diffraction (HAXRD), X-ray reflectivity (XRR) and vibrating sample magnetometry (VSM). Permalloy monoxide films ranging in thickness from 30 to 100nm were investigated. The crystalline and magnetic properties of these metastable oxide films are found to depend on (1) the choice of specular versus non-specular RDIBS geometric placement of the ion beam target sputtering source, target and substrate; (2) the use of Ar+(lighter) or Kr+(heavier) sputter ions; and (3) the choice of substrate temperature during sputtering. In addition, the use of modest 500K post-deposition vacuum anneals in a static magnetic film were also observed to greatly improve the magnetic properties of exchanged biased PyO/Py bilayer structures (Py=Ni81Fe19). When optimally processed, RDIBS fabricated permalloy monoxide films can be used to fabricate exchange biased PyO/Py bilayers with improved coercivity characteristics than previously found in equivalent magnetron sputtered PyO/Py or similarly ion beam sputtered NiO/Py bilayer samples.