The influence of ion beam sputtering geometry on metastable (Ni81Fe19)O/Ni81Fe19 exchange biased bilayers
The influence of ion beam sputtering geometry on metastable (Ni81Fe19)O/Ni81Fe19 exchange biased bilayers
复制标题
离子束溅射几何结构对亚稳态 (Ni81Fe19)O/Ni81Fe19 交换偏置双层的影响
DOI:
10.1016/j.jallcom.2003.09.088
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发表时间:
2004
影响因子:
6.2
通讯作者:
Carlos F. Gutierrez
中科院分区:
文献类型:
--
作者:
A. Bandyopadhyay;S. Rios;Albert Tijerina;Carlos F. Gutierrez
Metastable polycrystalline permalloy monoxide films (Ni81Fe19)O or PyO, with NiO-type rocksalt crystalline have been fabricated by reactive dual ion beam sputtering (RDIBS). These materials were characterized with high angle X-ray diffraction (HAXRD), X-ray reflectivity (XRR) and vibrating sample magnetometry (VSM). Permalloy monoxide films ranging in thickness from 30 to 100nm were investigated. The crystalline and magnetic properties of these metastable oxide films are found to depend on (1) the choice of specular versus non-specular RDIBS geometric placement of the ion beam target sputtering source, target and substrate; (2) the use of Ar+(lighter) or Kr+(heavier) sputter ions; and (3) the choice of substrate temperature during sputtering. In addition, the use of modest 500K post-deposition vacuum anneals in a static magnetic film were also observed to greatly improve the magnetic properties of exchanged biased PyO/Py bilayer structures (Py=Ni81Fe19). When optimally processed, RDIBS fabricated permalloy monoxide films can be used to fabricate exchange biased PyO/Py bilayers with improved coercivity characteristics than previously found in equivalent magnetron sputtered PyO/Py or similarly ion beam sputtered NiO/Py bilayer samples.