MASS-TRANSPORT STUDY FOR THE ELECTRODISSOLUTION OF COPPER IN 1M HYDROCHLORIC-ACID SOLUTION BY IMPEDANCE
MASS-TRANSPORT STUDY FOR THE ELECTRODISSOLUTION OF COPPER IN 1M HYDROCHLORIC-ACID SOLUTION BY IMPEDANCE
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DOI：
10.1149/1.2220917
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发表时间：
1993-10-01
影响因子：
3.9
通讯作者：
TRIBOLLET, B
中科院分区：
文献类型：
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作者：
BARCIA, OE;MATTOS, OR;TRIBOLLET, B
用稳态(不同圆盘转速下的电流-电压曲线)和暂态[电化学和电流体(EHD)阻抗的频率分析]研究了铜在1M氯化物溶液中的溶解。阳极极化曲线呈现出一个混合动力学区域和另一个以电流平台为特征的质量传输控制区域。在整个转速范围内，极限电流是OMEGA1/2的函数。从阳极平台下观察到的EHD阻抗图表明，CuCl2-对质量输运的限制是由于CuCl2-。在目前的平台上，EHD阻抗图上两个时间常数的存在和曲线的简约性被归因于覆盖在表面的盐层的存在，该盐层的形成速度与溶解速度相同。建立了一种层状模型。
The dissolution of copper in 1M chloride solution was studied by steady-state (current-voltage curves for various disk rotation rates) and transient [frequency analysis of the electrochemical and electrohydrodynamical (EHD) impedance] measurements. The anodic polarization curves have presented one region of mixed kinetic and another of mass-transport control characterized by a current plateau. The limiting current is a OMEGA1/2 function throughout the whole range of rotation rates. From the EHD impedance diagrams observed below the anodic plateau, it was shown that the limitation by mass transport is due to CuCl2-. On the current plateau, the presence of two time constants on the EHD impedance diagram and the reductibility of the curves have been attributed to the existence of a salt layer covering the surface, the rate of formation of this layer being identical to the rate of dissolution. A layer model has been developed.