Hydrogen permeation barrier performance characterization of vapor deposited amorphous aluminum oxide films using coloration of tungsten oxide
Hydrogen permeation barrier performance characterization of vapor deposited amorphous aluminum oxide films using coloration of tungsten oxide
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DOI：
10.1016/s0257-8972(01)01697-8
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发表时间：
2002-04
影响因子：
5.4
通讯作者：
Y. Yamada-Takamura;F. Koch;H. Maier;H. Bolt
中科院分区：
文献类型：
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作者：
Y. Yamada-Takamura;F. Koch;H. Maier;H. Bolt
氧化铝的低氢扩散率和溶解度使得气相沉积的氧化铝（Al2O3）膜成为预期的氢渗透阻挡涂层。本文采用过滤真空电弧法制备了非晶Al2O3薄膜。作为基板，气相沉积的非晶氧化钨（WO3）膜，以表征氢渗透阻挡性能的Al2O3膜利用着色的WO3时，它形成HxWO3。将样品暴露于通量和角度量化的原子氢束，并且通过可见光至近红外范围的透射光谱来表征着色程度。使用这种方法，半微米厚的非晶Al2O3膜将到达下面的WO3膜的原子氢减少到3×10− 4。此外，薄至20 nm的Al2O3膜显示出4×10−3的原子氢还原。结果表明，气相沉积薄Al 2 O3膜作为原子氢渗透屏障的有效性。
Low hydrogen diffusivity and solubility of aluminum oxide make a vapor deposited aluminum oxide (Al2O3) film an anticipated hydrogen permeation barrier coating. In this paper, amorphous Al2O3film was deposited using filtered vacuum arc method. As a substrate, vapor deposited amorphous tungsten oxide (WO3) film was used in order to characterize hydrogen permeation barrier performance of the Al2O3film utilizing coloration of WO3when it forms HxWO3. The samples were exposed to the flux and angular quantified atomic hydrogen beam, and the degree of coloration was characterized by visible to near infrared range transmission spectroscopy. Using this method, a half-micron thick amorphous Al2O3film reducing atomic hydrogen reaching the underlying WO3film to 3×10−4was measured. Furthermore, Al2O3film as thin as 20 nm showed atomic hydrogen reduction of 4×10−3. The results indicate effectiveness of thin vapor deposited Al2O3film as a permeation barrier against atomic hydrogen.