Photochemical process of divalent germanium responsible for photorefractive index change in GeO2-SiO2 glasses.
Photochemical process of divalent germanium responsible for photorefractive index change in GeO2-SiO2 glasses.
复制标题
DOI:
10.1016/j.jnoncrysol.2004.08.037
复制
发表时间:
2003-10
期刊:
影响因子:
3.8
通讯作者:
Akifumi Sakoh;Masahide Takahashi;T. Yoko;J. Nishii;Hiroaki Nishiyama;I. Miyamoto
中科院分区:
文献类型:
--
作者:
Akifumi Sakoh;Masahide Takahashi;T. Yoko;J. Nishii;Hiroaki Nishiyama;I. Miyamoto
The photoluminescence spectra of the divalent Ge (Ge2+) center in GeO2–SiO2glasses with different photosensitivities were investigated by means of excitation-emission energy mapping to correlate the ultraviolet light induced photorefractivity with the local structure around the Ge2+centers. The glasses with a larger photorefractivity tended to exhibit a greater band broadening of the singlet–singlet transition to higher excitation energies accompanied by an increase in the Stokes shifts. This strongly suggests the existence of a highly photosensitive Ge2+centers with higher excitation energies. It was also found that the introduction of a hydroxyl group or boron species modifies the local environment of Ge2+leading to an enhanced photorefractivity.