Fabrication of High-Purity V-4CR-4TI Low Activation Alloy Products
Fabrication of High-Purity V-4CR-4TI Low Activation Alloy Products
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高纯度V-4CR-4TI低活化合金产品的制造
DOI：
10.13182/fst01-a11963314
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发表时间：
2001
期刊：
影响因子：
--
通讯作者：
M. Sakata
中科院分区：
文献类型：
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作者：
T. Nagasaka;T. Muroga;M. Imamura;S. Tomiyama;M. Sakata
利用NIFS-HEAT-1铸锭，通过对传统制造工艺的改进，制备了高纯度V-4Cr-4Ti低活化合金板材、线材等产品。在制造过程中，分别观察到氢气和氧气水平的显著和小幅增加。然而，这些污染物在真空中通过673 K或更高的热处理释放出来。为获得合适的热处理条件，对厚度分别为6.6、4.0、1.9 mm的板材冷轧后的再结晶行为进行了研究。结果表明，在1273 K下退火1 ~ 2小时可获得20 ~ 30 μm的再结晶晶粒。只有在1.9 mm厚的板经过较大程度的交叉轧制时，在表面附近才观察到一层较细的晶粒。NIFS-HEAT-1产品正在接受日本各大学的循环测试。
High-purity V-4Cr-4Ti low activation alloy products, such as plates and wires, were fabricated from the NIFS-HEAT-1 ingot with improvements of the conventional manufacturing processes. During fabrication, significant and small increase in hydrogen and oxygen level were observed, respectively. However, these contaminants were released by a heat treatment at 673 K or higher in a vacuum. For the purpose of obtaining an appropriate thermomechanical treatment condition, recrystallization behavior of plate products, which were 6.6, 4.0, 1.9 mm thick, was investigated after cold rolling. It was revealed that annealing at 1273 K for one to two hours provides recrystallized grains of 20-30 μm. Only in the case of 1.9 mm-thick plates which experienced large degree of cross rolling, a layer of finer grain was observed in the vicinity of the surface. The NIFS-HEAT-1 products are going through Round-robin tests by Japanese universities.