Confocal scanning photoluminescence for mapping electron and photon beam-induced microscopic changes in SiN(x)during nanopore fabrication

Confocal scanning photoluminescence for mapping electron and photon beam-induced microscopic changes in SiN(x)during nanopore fabrication
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共焦扫描光致发光用于绘制纳米孔制造过程中电子和光子束引起的 SiN(x) 微观变化

DOI:
10.1088/1361-6528/ab9bd4
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发表时间:
2020
期刊:
影响因子:
3.5
通讯作者:
Guan Weihua
Guan Weihua
中科院分区:
材料科学3区
文献类型:
--
作者:
He Xiaodong;Tang Zifan;Liang Shengfa;Liu Ming;Guan Weihua

文献摘要

相似文献

聚焦的电子束和激光束已经显示出在sinx膜上形成纳米级孔的能力。在制造过程中,由于需要定位、对准和聚焦,最终纳米孔位置以外的区域将不可避免地暴露在电子束或激光束下。目前尚不清楚这些意外暴露如何影响膜的完整性。在这项工作中,我们展示了使用共聚焦扫描光致发光(PL)来绘制暴露于电子束和激光束时sinx纳米孔的微观变化。我们开发并验证了扫描PL结果的定量解释模型。模型表明,扫描PL结果对纳米孔尺寸不敏感。相反,它是由两个微观材料因素的产物主导的:量子产率曲线(即电子结构的变化)和厚度曲线(即膜的变薄)。我们通过实验证明,即使薄膜没有变薄,电子和激光束也可以改变材料的电子结构(即量子产率)。我们的研究结果表明,如果想要薄膜的微观完整性,在制造过程中最小化无意的电子束或激光束到SiN x是至关重要的。
Focused electron and laser beams have shown the ability to form nanoscale pores in SiN x membranes. During the fabrication process, areas beyond the final nanopore location will inevitably be exposed to the electron beams or the laser beams due to the need for localization, alignment and focus. It remains unclear how these unintended exposures affect the integrity of the membrane. In this work, we demonstrate the use of confocal scanning photoluminescence (PL) for mapping the microscopic changes in SiN x nanopores when exposed to electron and laser beams. We developed and validated a model for the quantitative interpretation of the scanned PL result. The model shows that the scanning PL result is insensitive to the nanopore size. Instead, it is dominated by the product of two microscopic material factors: quantum yield profile (ie variations in electronic structure) and thickness profile (ie thinning of the membrane). We experimentally demonstrated that the electron and laser beams could alter the material electronic structures (ie quantum yield) even when no thinning of the membrane occurs. Our results suggest that minimizing the unintended e-beam or laser beam to the SiN x during the fabrication is crucial if one desires the microscopic integrity of the membrane.