Study on retention behavior and chemical states of energetic deuterium implanted into carbon-contained boron film
Study on retention behavior and chemical states of energetic deuterium implanted into carbon-contained boron film
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DOI：
10.1016/j.jnucmat.2008.12.125
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发表时间：
2009-04
影响因子：
3.1
通讯作者：
Y. Kikuchi;Yu Yang;A. Yoshikawa;T. Suda;A. Sagara;N. Noda;Y. Oya;K. Okuno
中科院分区：
文献类型：
--
作者：
Y. Kikuchi;Yu Yang;A. Yoshikawa;T. Suda;A. Sagara;N. Noda;Y. Oya;K. Okuno
用X射线光电子能谱(XPS)和X射线能谱(TDS)研究了含碳硼膜中高能重氢(D)的保留行为和化学状态。从TDS结果可以看出，D的解吸过程包括以下四个阶段。其中两个是D与B结合形成B-D-B和B-D键的解吸，另两个被认为是与C以不同构型结合的解吸。这些结果与XPS的结果一致，表明在含碳的硼膜中形成了C-B(Sp2)、C-B(Sp3)和C-C键。这些脱附峰属于B-C-D和C-C-D键，D主要被C捕获，脱附温度高于B，表明C捕获的D将是聚变装置氢同位素保留控制的关键问题。结果表明，D被C捕获，特别是以C-C-D键的形式存在，即使在高温下也是化学稳定的。
Retention behavior and chemical states of energetic deuterium (D) implanted into a carbon-contained boron film were investigated by XPS and TDS. It was found from the TDS results that D desorption processes were consisted of following four stages. Two of them were the desorptions of D bound to B as forming B–D–B and B–D bonds, and the others were thought to be that bound to C with different configurations. These results were consistent with the XPS results, showing the C–B (sp2), C–B (sp3) and C–C bonds were formed in the carbon contained boron film. These desorption peaks were attributed to B–C–D and C–C–D bonds, and most of D was mainly trapped by C and desorption temperature was higher than trapped by B, indicating that the D trapped by C would be critical issue for the hydrogen isotope retention control in fusion devices. It was concluded that D trapped by C, especially as C–C–D bond, was chemically stable even though at high temperature.