Electric properties of 4H-SiC MIS devices with AlON/SiO_2 stacked gate dielectrics
Electric properties of 4H-SiC MIS devices with AlON/SiO_2 stacked gate dielectrics
复制标题
AlON/SiO_2堆叠栅介质的4H-SiC MIS器件的电性能
DOI:
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发表时间:
2007
期刊:
影响因子:
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通讯作者:
et. al.
中科院分区:
文献类型:
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作者:
Y. Watanabe;et. al.