Roughness Reduction of Large-Area High-Quality Thick Al Coatings for Large-Size Echelle Gratings by Chemical Mechanical Polishing
Roughness Reduction of Large-Area High-Quality Thick Al Coatings for Large-Size Echelle Gratings by Chemical Mechanical Polishing
复制标题
化学机械抛光降低大尺寸阶梯光栅大面积高质量厚铝层粗糙度
DOI：
10.1166/nnl.2018.2562
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发表时间：
2018
影响因子：
--
通讯作者：
Xing Scott
中科院分区：
文献类型：
--
作者：
Song Chi;Li Zizheng;Zhang Xin;Li Qiang;Yang Haigui;Gao Jinsong;Xing Scott
大面积高质量厚Al涂层是实现大尺寸中阶梯光栅高性能刻划的关键因素之一。基于我们以前的工作，我们提出了使用精密机械抛光方法，以进一步降低厚铝膜的表面粗糙度。采用多步沉积工艺可以有效地将12 μ m厚Al膜的表面粗糙度Rq控制在25 nm以下。为了提高厚铝涂层的表面质量，采用了化学机械抛光的方法。Al膜的Rq显著降低至5.26 nm。对抛光后的样品进行了表面形貌、横截面和膜层硬度的测试。最后，在抛光样品上制作了中阶梯光栅，在632.8nm激光波长下，36阶衍射效率为50%。该工作对高质量厚铝膜的研究和大尺寸中阶梯光栅的性能提升具有重要意义。
Large-area high-quality thick Al coating is one of the most important factor which always acts as a ruling substrate in realizing high-performance large-size echelle grating ruling process. Based on our previous work, we proposed use of precise mechanical polishing methods to further reduce surface roughness of thick Al films. Surface roughness Rq of 12 μm-thick Al film can be effectively controlled under 25 nm by early reported multi-step deposition process. The chemical mechanical polishing method was chosen in this study to improve the surface quality of thick Al coating. Rq of Al film was significantly reduced to 5.26 nm as a consequence. The surface morphology, cross section and film hardness of the polished samples were also investigated in detail. Finally, the echelle grating was fabricated on the polishing sample and the diffraction efficiency was 50% at 632.8 nm laser and 36th order. This work has great potential for both high-quality thick Al film research and large-size echelle grating performance enhancement.