M. Syed: "Structure of poly-Si films deposited at low temperature by plasma CVD on substrates exposed to different plasma"Thin Solid Films. 337. 27-31 (1999)
M. Syed: "Structure of poly-Si films deposited at low temperature by plasma CVD on substrates exposed to different plasma"Thin Solid Films. 337. 27-31 (1999)
复制标题
M. Syed:“通过等离子体 CVD 在暴露于不同等离子体的基材上低温沉积的多晶硅薄膜的结构”固体薄膜。
DOI:
--
复制
发表时间:
--
期刊:
影响因子:
--
通讯作者:
中科院分区:
文献类型:
--
作者: