Thin film diamond

Thin film diamond
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薄膜金刚石

DOI:
10.1007/978-94-011-0725-9
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发表时间:
1994
影响因子:
3.9
通讯作者:
J. Steeds
J. Steeds
中科院分区:
工程技术4区
文献类型:
--
作者:
A. Lettington;J. Steeds

文献摘要

被引文献

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第一部分成核生长与加工:化学气相沉积金刚石的历史观点、现状与关键问题,J.C. Angus薄膜金刚石生长机理,J.E. Butler微波等离子体化学气相沉积金刚石,P.K. Bachmann气相镍基局部外延生长金刚石,Y. Sato。第2部分表征和性能:半导体金刚石的电子和光学性能,A.T. Collins研究金刚石宝石和薄膜的导热性,T.R. Anthony研究多晶CVD金刚石,C.D. Clark研究CVD金刚石的强度、断裂和侵蚀性能,J.E. Field。第三部分类金刚石及其应用:类金刚石的沉积,J. Robertson类金刚石薄膜的应用,A.H. Lettington。第四部分金刚石薄膜的应用:金刚石作为耐磨涂层,B. Lux金刚石晶体管的性能和制造,M. w . Geis薄膜金刚石的热学和光学应用,M. Seal。
Part 1 Nucleation growth and processing: chemical vapour deposition of diamond - historical perspective, current status and critical problems, J.C. Angus thin film diamond growth mechanisms, J.E. Butler microwave plasma chemical vapour deposition of diamond, P.K. Bachmann local epitaxial growth of diamond on nickel from the vapour phase, Y. Sato. Part 2 Characterization and properties: the electronic and optical properties of semiconducting diamond, A.T. Collins the thermal conductivity of diamond gems and thin films, T.R. Anthony characterization of polycrystalline CVD diamond, C.D. Clark strength, fracture and erosion properties of CVD diamond, J.E. Field. Part 3 Diamond-like carbon and its applications: deposition of diamond-like carbon, J. Robertson applications of diamond-like thin films, A.H. Lettington. Part 4 Applications of diamond films: diamond as a wear-resistant coating, B. Lux diamond transistor performance and fabrication, M.W. Geis thermal and optical applications of thin film diamond, M. Seal.