Hierarchically Ordered Silicon Metastructures from Improved Self-Assembly-Based Nanosphere Lithography

Hierarchically Ordered Silicon Metastructures from Improved Self-Assembly-Based Nanosphere Lithography
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来自改进的基于自组装的纳米球光刻的分层有序硅超结构。

DOI:
10.1021/acsami.9b22932
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发表时间:
2020-03-11
影响因子:
9.5
通讯作者:
Liu, Yan Jun
Liu, Yan Jun
中科院分区:
材料科学2区
文献类型:
--
作者:
Fang, Xiaoguo;Zheng, Changxiong;Liu, Yan Jun

文献摘要

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我们发展了一种改进的自组装方法,以获得大面积,高质量的模板单层掩模使用聚苯乙烯球。基于模板掩模,利用循环电感耦合等离子体刻蚀技术制备了具有不同纳米台阶的分级有序硅亚结构。通过在这些硅亚结构上蒸镀一层薄的金覆盖层,利用表面增强拉曼散射光谱对其光学性质进行了比较研究。我们提出的技术是非常有前途的制造各种周期性的三维层次有序的亚结构,这可以进一步用于基于SERS的生物传感器,光学吸收,超材料/超表面器件等的应用。
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