Hierarchically Ordered Silicon Metastructures from Improved Self-Assembly-Based Nanosphere Lithography
Hierarchically Ordered Silicon Metastructures from Improved Self-Assembly-Based Nanosphere Lithography
复制标题
来自改进的基于自组装的纳米球光刻的分层有序硅超结构。
DOI:
10.1021/acsami.9b22932
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发表时间:
2020-03-11
影响因子:
9.5
通讯作者:
Liu, Yan Jun
中科院分区:
文献类型:
--
作者:
Fang, Xiaoguo;Zheng, Changxiong;Liu, Yan Jun
We develop an improved self-assembly method to obtain a large-area, high-quality templated monolayer mask using the polystyrene spheres. Based on the templated mask, hierarchically ordered Si metastructures with different nanosteps are fabricated using cyclic inductively coupled plasma etching technique. By evaporating a thin gold capping layer on these Si metastructures, their optical properties are comparatively studied using the surface-enhanced Raman scattering spectroscopy. Our proposed technique is highly promising for fabricating a variety of periodic three-dimensional hierarchically ordered metastructures, which could be further utilized for applications in SERS-based biosensors, optical absorbers, metamaterial/metasurface devices, etc.