High-quality beam generation using an RF gun and a 150 MeV microtron
High-quality beam generation using an RF gun and a 150 MeV microtron
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使用射频枪和 150 MeV 微电子管产生高质量光束
DOI：
10.1016/s0168-9002(00)00736-1
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发表时间：
2000
影响因子：
1.4
通讯作者：
T. Hirose
中科院分区：
文献类型：
--
作者：
R. Kuroda;M. Washio;S. Kashiwagi;T. Kobuki;I. Ben;Xuelong Wang;T. Hori;F. Sakai;A. Tsunemi;J. Urakawa;T. Hirose
低发射率亚皮秒电子脉冲有望在自由电子激光、激光加速、逆康普顿散射产生飞秒X射线、脉冲辐解等广泛领域得到应用。为了产生低发射率亚皮秒电子脉冲，我们正在开发一台紧凑型Racetrack Microtron（RTM），其新型5 MeV注入系统采用激光光阴极RF枪（Washio等人，1996年10月28日在成都召开的第七届中日辐射化学双边研讨会。到目前为止，RTM的操作一直保持在长脉冲模式的束加载的稳定状态下（Washio等人，J. Surf. Sci. Soc. Jpn. 19（2）（1998）23）。在早期的工作中（Washio等人，PAC99，March 31，纽约，美国，1999），成功地对单脉冲加速情况进行了数值模拟。最后，改进后的RTM被证明是一个有用的加速器下的瞬态束流加载皮秒电子脉冲的产生。在RTM中，皮秒电子脉冲被加速到149.6MeV，注入5MeV电子束团，脉冲宽度为10ps（FWHM），每脉冲电荷为1nC，发射度为3πmmmrad。
Low-emittance sub-picosecond electron pulses are expected to be used in a wide field, such as free electron laser, laser acceleration, femtosecond X-ray generation by Inverse Compton scattering, pulse radiolysis, etc. In order to produce the low-emittance sub-picosecond electron pulse, we are developing a compact Racetrack Microtron (RTM) with a new 5MeV injection system adopting a laser photo cathode RF gun (Washio et al., Seventh China–Japan Bilateral Symposium on Radiation Chemistry, October 28, Cengdu, China, 1996). The operation of RTM has been kept under a steady state of beam loading for long pulse mode so far (Washio et al., J. Surf. Sci. Soc. Jpn. 19 (2) (1998) 23). In earlier work (Washio et al., PAC99, March 31, New York, USA, 1999), we have succeeded in the numerical simulation for the case of single short pulse acceleration. Finally, the modified RTM was demonstrated as a useful accelerator for a picosecond electron pulse generation under a transient state of beam loading. In the simulation, a picosecond electron pulse was accelerated to 149.6MeV in RTM for the injection of 5MeV electron bunch with a pulse length of 10ps (FWHM), a charge of 1nC per pulse, and an emittance of 3πmmmrad.