Sputtered metal and silicon cluster ions: collision-induced fragmentation and neutralization
Sputtered metal and silicon cluster ions: collision-induced fragmentation and neutralization
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溅射金属和硅簇离子：碰撞引起的碎裂和中和
DOI：
10.1007/978-3-642-74913-1_52
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发表时间：
1989
期刊：
影响因子：
--
通讯作者：
H. Lutz
中科院分区：
文献类型：
--
作者：
W. Begemann;R. Hector;Y. Y. Liu;J. Tiggesbäumker;K. Meiwes;H. Lutz
通过溅射产生质量分离的金属和硅团簇离子束M+，− n，并在Ar和SF6中以不同的动能（100-1800 eV）进行碎裂和/或中和碰撞。稀有气体碰撞产生的碎片花样为确定团簇的电离能和电子亲合势开辟了一条新的途径。这些值进行了比较，已知的实验和理论数据。对于带负电荷的团簇，气体靶中的吸收主要是由于中和，截面随团簇材料、原子数和碰撞伙伴的变化而变化，从10 <$2到约50 <$2。
Mass separated metal and silicon cluster ion beams M+,−nare produced by sputtering and undergo fragmenting and/or neutralizing collisions at different kinetic energies (100-1800 eV) in Ar and SF6. Fragment patterns induced by rare gas collisions open a way to determine ionization potentials and electron affinities of clusters. These values are compared to known experimental and theoretical data. For negatively charged clusters the absorption in gas targets is mainly due to neutralization, the cross sections varying with cluster material, number of atoms and collision partner from 10 Å2to about 50 Å2.