Chemical physics of thin film deposition processes for micro- and nano-technologies
Chemical physics of thin film deposition processes for micro- and nano-technologies
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微米和纳米技术薄膜沉积过程的化学物理
DOI：
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发表时间：
2002
期刊：
影响因子：
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通讯作者：
Y. Pauleau
中科院分区：
文献类型：
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作者：
Y. Pauleau
前言。参与者名单。投稿人列表。电子元件和微系统的电镀和化学沉积工艺，例如：Daenen，D.L.de Kubber。自组装电活性超薄膜T.P.Cassagneau半导体材料M.Konuma液相外延中层生长的特征和机制。陶瓷薄膜的Sol-Gel沉积工艺D.Sporn等。金属-有机前驱体S.Mathur的Sol-Gel和CVD薄膜沉积热化学气相沉积过程中流动和化学的数值模拟超导体和氧化物薄膜的化学气相沉积G·瓦尔等人。选择性化学气相沉积J.霍尔曼。光化学气相沉积薄膜S.J.C.激光辅助化学气相沉积微结构的反应机理。近端探针诱导化学加工用于纳米器件的精加工。高能原子薄膜生长的分子动力学模拟。W·古尔宾斯基溅射沉积薄膜。高温下高通量、低能氮离子轰击奥氏体不锈钢中的质量输运索引。
Preface. List of Participants. List of Contributors. Electroplating and Electroless Deposition Processes for Electronic Components and Microsystems T.E.G. Daenen, D.L. de Kubber. Self-Assembled Electroactive Ultrathin Films T.P. Cassagneau. Feature and Mechanisms of Layer Growth in Liquid Phase Epitaxy of Semiconductor Materials M. Konuma. Sol-Gel Deposition Processes of Thin Ceramic Films D. Sporn, et al. Thin Film Deposition by Sol-Gel and CVD Processing of Metal-Organic Precursors S. Mathur. Numerical Simulation of Flow and Chemistry in Thermal Chemical Vapor Deposition Processes C.R. Kleijn. Chemical Vapor Deposition of Superconductor and Oxide Films G. Wahl, et al. Selective Chemical Vapor Deposition J. Holleman. Photochemical Vapour Deposition of Thin Films S.J.C. Irvine. Reaction Mechanisms in Laser-Assisted Chemical Vapor Deposition of Microstructures Y. Pauleau, D. Tonneau. Proximal Probe Induced Chemical Processing for Nanodevice Elaboration D. Tonneau, et al. Molecular Dynamics Simulation of Thin Film Growth with Energetic Atoms C.M. Gilmore, J.A. Sprague. Deposition of Thin Films by Sputtering W. Gulbinski. Mass-Transport in an Austenitic Stainless Steel under High-Flux, Low-Energy Nitrogen Ion Bombardment at Elevated Temperature L. Pranevicius, et al. Index.