Growth of single-crystalline AlZnO nanorods by simple vapor deposition method

Growth of single-crystalline AlZnO nanorods by simple vapor deposition method
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DOI:
10.1016/j.matlet.2006.11.124
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发表时间:
2007-07
期刊:
影响因子:
3
通讯作者:
R. Deng;Y. Zou;Zhengwang Chen;G. Jiang;Honggao Tang
R. Deng;Y. Zou;Zhengwang Chen;G. Jiang;Honggao Tang
中科院分区:
材料科学3区
文献类型:
--
作者:
R. Deng;Y. Zou;Zhengwang Chen;G. Jiang;Honggao Tang

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采用简单的气相沉积方法,在不同温度下,分别用不同的源在硅衬底上制备了具有不同Al浓度和不同直径的AlZnO纳米棒阵列。采用场发射扫描电子显微镜(FESEM)和透射电子显微镜(TEM)对样品的形貌和微观结构进行了表征。X射线荧光分析表明,Al/(Al+Zn)原子比分别约为3%和1.6%。观察到Al掺杂引起的强紫外发射的Burstein-Moss(BM)位移。
Well-aligned AlZnO nanorod arrays with various Al concentrations and various diameters were prepared on silicon substrate by a simple vapor deposition with separate sources at different temperatures. Field emission scanning electron microscope (FESEM) and transmission electron microscopy (TEM) were carried out to characterize morphology and microstructure. X-ray fluorescence shows that the atomic ratio of Al/(Al+Zn) of the arrays is determined to be about 3% and 1.6%, respectively. The Burstein–Moss (BM) shift of the strong ultraviolet emission is observed due to Al incorporation.