Giant magnetoresistance in Co–Cu granular alloy films and nanowires prepared by pulsed-electrodeposition
Giant magnetoresistance in Co–Cu granular alloy films and nanowires prepared by pulsed-electrodeposition
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脉冲电沉积制备的 Co-Cu 颗粒合金薄膜和纳米线中的巨磁阻
DOI：
10.1016/s0013-4686(99)00075-4
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发表时间：
1999
影响因子：
6.6
通讯作者：
N. Fukumuro
中科院分区：
文献类型：
--
作者：
K. Miyazaki;S. Kainuma;K. Hisatake;Torhu Watanabe;N. Fukumuro
采用脉冲电沉积法制备了CoxCu 1 − x合金薄膜和纳米线。通过控制电流脉冲的脉宽和固定的沉积截止时间来改变合金成分。在玻璃板上生长的蒸发Cu膜上形成合金膜。在所研究的成分范围内（0.17≤x≤0.66），薄膜的面心立方晶格常数随Co含量的增加而减小，当x≥0.42时，薄膜中出现了第二相，可能是六方密排相。使用XRD数据和Scherrer公式计算的沉积状态下的微晶尺寸在10-30 nm之间。在400-600°C之间的适当温度下退火后，发现磁阻（MR）变大。在x=0.2左右的组成下观察到约4%的MR比率的最大值。测量了Co_（0.31）Cu_（0.69）的磁滞曲线，并与溅射合金薄膜的磁滞曲线进行了比较。颗粒状纳米线制备成的氧化铝板的孔也进行了检查和简要报告。
Granular CoxCu1−xalloy films and nanowires were prepared by pulsed-electrodeposition. The alloy composition was changed by controlling pulse-width of the current pulse with fixed off-time of the deposition. Alloy films were formed onto evaporated Cu films grown on glass plates. The face-centered cubic lattice parameter was found to decrease with increasing Co content in the films in the composition range investigated (0.17≤x≤0.66), and the second phase, probably by hexagonal close-packed phase, appeared at x≥0.42. The crystallite size of the as-deposited condition calculated using the XRD data and the Scherrer’s formula ranged between 10–30 nm. The magnetoresistance (MR) was found to become larger after annealing at an appropriate temperature between 400–600°C. The maximum value of the MR ratio of about 4% was observed at the composition around x=0.2. Magnetic hysteresis curves were measured for Co0.31Cu0.69and compared with those reported for sputtered alloy films. Granular nanowires prepared into the pores of the alumite plate were also examined and reported briefly.