Plasma-enhanced chemical-vapour-deposition of thin films by corona discharge at atmospheric pressure
Plasma-enhanced chemical-vapour-deposition of thin films by corona discharge at atmospheric pressure
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DOI：
10.1016/s0257-8972(97)00158-8
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发表时间：
1997-12
影响因子：
5.4
通讯作者：
R. Thyen;A. Weber;C. Klages
中科院分区：
文献类型：
--
作者：
R. Thyen;A. Weber;C. Klages
在低温条件下，采用近大气压或大气压下的电晕放电（也称为介质阻挡放电或无声放电）沉积有机和无机薄膜。采用四甲基硅烷（TMS，Si[CH 3]4）或正硅酸乙酯（TEOS，Si[OC 2 H 5]4）在含氧气氛中沉积无机SiO2薄膜。在惰性氩/氮气氛中，TMS形成非晶等离子体聚合物状氢化硅碳涂层（a-SiC：H）。烃类如甲烷（CH 4）、乙炔（C2 H2）或炔丙醇（HC 2CH 2 OH）作为单体导致聚合物状无定形氢化碳涂层（a-C：H）。用乙炔（C_2F_4）沉积类聚四氟乙烯碳涂层（a-C：F）。根据薄膜的组成，硅的表面能在16到66 mNm − 1之间，聚丙烯的表面能在16到62 mNm − 1之间。
A corona discharge (also called dielectric barrier discharge or silent discharge) near or at atmospheric pressure was used for the deposition of organic and inorganic thin films at low temperatures. Inorganic SiOxthin films were deposited with tetramethylsilane (TMS, Si[CH3]4) or tetraethylortosilicate (TEOS, Si[OC2H5]4) in oxygen-containing atmospheres. In inert argon/nitrogen atmospheres, TMS formed amorphous plasmapolymerlike hydrogenated silicon carbon coatings (a-SiC:H). Hydrocarbons like methane (CH4), ethine (C2H2) or propargyl alcohol (HC2CH2OH) as monomers lead to polymer-like amorphous hydrogenated carbon coatings (a-C:H). With tetrafluoroethene (C2F4) teflon-like carbon coatings (a-C:F) were deposited. Surface energies between 16 and 66mNm−1on silicon and between 16 and 62mNm−1on polypropylene were obtained depending on the film composition.