Low-Temperature Graphitization of Poly(acrylonitrile) Densely Grafted onto a Silica Core Surface
Low-Temperature Graphitization of Poly(acrylonitrile) Densely Grafted onto a Silica Core Surface
复制标题
二氧化硅核表面致密接枝聚丙烯腈的低温石墨化
DOI：
10.1016/j.polymer.2021.123768
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发表时间：
2021
期刊：
影响因子：
4.6
通讯作者：
Tokita Masatoshi
中科院分区：
文献类型：
--
作者：
Yamazaki Shohei;Yoshida Keiichiro;Matsumoto Hidetoshi;Tokita Masatoshi
这项研究实现了一种石墨结构，从低温碳化的聚（丙烯腈）（PAN）接枝到纳米粒子的表面上，密度为0.3链nm−2。温度升高至800 °C，这比常规石墨化工艺中的温度低2000 °C。两种类型的PAN接枝的纳米粒子与不同的核心直径为30和150 nm的制备和浇铸成膜的溶液。该膜包括以面心立方（FCC）晶格排列的核，其在碳化后保持，尽管具有缩短的晶格侧。通过氢氟酸蚀刻的二氧化硅芯的洗脱产生具有FCC排列的孔的SiO2 PAN膜。该PAN具有与石墨结构相关的X射线衍射（XRD）峰。相反，具有0.05链nm− 2的较低接枝密度的类似PAN接枝纳米颗粒的相同碳化产生类似的多孔碳膜，但石墨结构没有通过相关的XRD图案得到证明。这些结果证实，低温石墨化需要PAN链到固体表面上的致密接枝。
This study realized a graphitic structure from the low-temperature carbonization of poly(acrylonitrile) (PAN) grafted onto a nanoparticle's surface at a density of 0.3 chains nm−2. The temperature was increased up to 800 °C, which is 2000 °C lower than that in conventional graphitization processes. Two types of PAN-grafted nanoparticles with different core diameters of 30 and 150 nm were prepared and cast from a solution into films. The films comprised cores arranged in a face-centered cubic (FCC) lattice, which was maintained after the carbonization, albeit with shortened lattice sides. Elution of the silica cores by hydrofluoric acid etching produced carbonized PAN films with FCC-arranged pores. The carbonized PAN exhibited X-ray diffraction (XRD) peaks associated with the graphitic structure. Conversely, the same carbonization of similar PAN-grafted nanoparticles with a lower grafting density of 0.05 chains nm−2produced similar porous carbon films, but the graphitic structure was not evidenced by the associated XRD patterns. These results confirm that lower-temperature graphitization requires dense grafting of PAN chains onto a solid surface.