Highly indistinguishable photons from deterministic quantum-dot microlenses utilizing three-dimensional in situ electron-beam lithography.
Highly indistinguishable photons from deterministic quantum-dot microlenses utilizing three-dimensional in situ electron-beam lithography.
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DOI:
10.1038/ncomms8662
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发表时间:
2015-07-16
影响因子:
16.6
通讯作者:
Reitzenstein S
中科院分区:
文献类型:
--
作者:
Gschrey M;Thoma A;Schnauber P;Seifried M;Schmidt R;Wohlfeil B;Krüger L;Schulze JH;Heindel T;Burger S;Schmidt F;Strittmatter A;Rodt S;Reitzenstein S
The success of advanced quantum communication relies crucially on non-classical light sources emitting single indistinguishable photons at high flux rates and purity. We report on deterministically fabricated microlenses with single quantum dots inside which fulfil these requirements in a flexible and robust quantum device approach. In our concept we combine cathodoluminescence spectroscopy with advanced in situ three-dimensional electron-beam lithography at cryogenic temperatures to pattern monolithic microlenses precisely aligned to pre-selected single quantum dots above a distributed Bragg reflector. We demonstrate that the resulting deterministic quantum-dot microlenses enhance the photon-extraction efficiency to (23±3)%. Furthermore we prove that such microlenses assure close to pure emission of triggered single photons with a high degree of photon indistinguishability up to (80±7)% at saturation. As a unique feature, both single-photon purity and photon indistinguishability are preserved at high excitation power and pulsed excitation, even above saturation of the quantum emitter. Single indistinguishable photon sources with high flux rates and purity are needed in quantum communications. Here, Gschrey et al. use three-dimensional electron-beam lithography to pattern deterministic quantum-dot microlenses and demonstrate enhanced photon-extraction efficiency and photon indistinguishability.