ELECTRICALLY EVOKED AUDITORY BRAIN-STEM RESPONSE - GROWTH OF RESPONSE WITH CURRENT LEVEL

ELECTRICALLY EVOKED AUDITORY BRAIN-STEM RESPONSE - GROWTH OF RESPONSE WITH CURRENT LEVEL
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DOI:
10.1016/0378-5955(91)90011-w
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发表时间:
1991-01-01
期刊:
影响因子:
2.8
通讯作者:
BROWN, CJ
BROWN, CJ
中科院分区:
医学1区
文献类型:
--
作者:
ABBAS, PJ;BROWN, CJ

文献摘要

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电诱发脑干反应(EABR)在耳蜗植入者中被测量,他们分别接受了inaid多通道植入或Nucleus多通道植入。虽然这两种植入物都使用多电极阵列,但它们在许多方面是不同的。在Ineraid系统中,电极可以通过经皮塞直接接触,刺激通常是相对于耳蜗外的共同地面在四个不同的耳蜗内电极上。在植入核中,刺激是通过一个内部线圈完成的,刺激是沿着22个电极阵列对之间的双极。两组受试者的ABR波形相似,在最高水平的刺激下由一系列3或4个正峰组成。使用正常刺激模式(Nucleus为双极刺激,inaid为单极刺激),两种设备的用户都表现出随着电流水平的增加,响应幅度增加,响应延迟减少。核子用户的反应阈值比核子用户高,反应随水平的增长也比核子用户缓慢。然而,对于两种植入物类型的双极刺激,当刺激电极间隔较近时,响应阈值较高,振幅随水平的增长比电极间距较远的情况更缓慢。当使用双极刺激和相似的电极间距时,两种植入物的响应增长和阈值相似。两种设备的测试结果都没有显示出与单词识别测试的表现有很强的相关性。
The electrically evoked brainstem response (EABR) was measured in cochlear implant users who had received either the Ineraid multichannel implant or the Nucleus multichannel implant. Although both implants use a multi-electrode array, they are different in a number of ways. In the Ineraid system the electrodes can be accessed directly through a percutaneous plug and stimulation is generally on four different intracochlear electrodes relative to a common ground outside the cochlea. In the Nucleus implant stimulation is accomplished via an internal coil and stimulation is bipolar between pairs along the 22 electrode array. The ABR waveforms were similar for both groups of subjects, consisting of a series of 3 or 4 positive peaks at the highest levels of stimulation. Using the normal stimulation mode (bipolar for Nucleus and monopolar for Ineraid), users of both devices demonstrated an increase in response amplitude and a decrease in response latency with increases in current level. The threshold of response tended to be higher and growth of the response with level tended to be more gradual for Nucleus users than for Ineraid users. However, with bipolar stimulation for both implant types, when the stimulating electrodes were closely spaced the threshold of response was higher and the growth of amplitude with level was more gradual than the case where the electrodes were separated further. When bipolar stimulation and similar electrode spacing was used, the response growth and threshold were similar for both implant types. Results from neither device showed a strong correlation with performance on word recognition tests.