Plasma-Enhanced Reactive Magnetron Sputtering Assisted with Inductively Coupled Plasma for Reactivity- Controlled Deposition of Microcrystalline Silicon Thin Films
Plasma-Enhanced Reactive Magnetron Sputtering Assisted with Inductively Coupled Plasma for Reactivity- Controlled Deposition of Microcrystalline Silicon Thin Films
复制标题
等离子体增强反应磁控溅射辅助感应耦合等离子体用于微晶硅薄膜的反应控制沉积
DOI：
10.7567/jjap.52.11nb05
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发表时间：
2013
影响因子：
1.5
通讯作者：
Yuichi Setsuhara and Akinori Ebe
中科院分区：
文献类型：
--
作者：
Kosuke Takenaka;Yuichi Setsuhara and Akinori Ebe
