Control of nonlinear distributed process systems : Recent developments and challenges
Control of nonlinear distributed process systems : Recent developments and challenges
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DOI：
10.1002/aic.690470302
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发表时间：
2001-03
期刊：
影响因子：
3.7
通讯作者：
P. Christofides
中科院分区：
文献类型：
--
作者：
P. Christofides
虽然大多数涉及VV过程本科过程控制课程仍然是使用线性传递函数模型的集总化学品的动力学和控制，但是在诸如半导体制造、纳米技术、生物技术和无人驾驶飞行器的增长领域中的关键技术需求已经激发了对跨越所有工程学科的复杂非线性分布式系统的分析和控制的广泛研究。从控制的角度来看，复杂的分布式系统的显着特点是，它们引起的非线性控制问题，涉及高度分布的控制变量的调节，通过使用空间分布的控制执行器和测量传感器。因此，复杂的分布式系统不能有效地控制与控制方法，假设状态，操纵和被控制的变量表现出集总的行为，或与线性控制算法的基础上得到的线性线性分布式模型。晶片温度分布的不均匀性。这反过来又可能导致薄膜沉积均匀性不符合工业界设定的严格要求（SIA，1997）。这种技术需求和RTCVD工艺的复杂特性（非线性、空间变化、批量性质）促使需要使用基于分布式工艺模型的非线性反馈控制器来控制晶片温度分布。这类问题的一个典型例子是控制二氧化钛气溶胶反应器，以实现几乎单分散的粒度分布（Kalani和Christofides，2000年）;这是二氧化钛颜料获得每单位质量最大遮盖粉末所需的。二氧化钛气溶胶颗粒尺寸分布的控制。
hile most deal with vv processes undergraduate process control courses still dynamics and control of lumped chemical using linear transfer function models, key technological needs in growth areas such as semiconductor manufacturing, nanotechnology, biotechnology, and unmanned aerial vehicles have motivated extensive research on analysis and control of complex nonlinear distributed systems across all engineering disciplines. From a control point of view, the distinguishing feature of complex distributed systems is that they give rise to nonlinear control problems that involve the regulation of highly distributed control variables by using spatially-distributed control actuators and measurement sensors. Thus, complex distributed systems cannot be effectively controlled with control methods which assume that the state, manipulated and tobe-controlled variables exhibit lumped behavior or with linear control algorithms derived on the basis of IinearAinearized distributed models. icant nonuniformity of the wafer temperature profile. This, in turn, may lead to film deposition uniformity that does not meet the tight requirements set by the industry (SIA, 1997). This technological need and the complex character (nonlinearities, spatial variations, batch nature) of the RTCVD process motivate the need to control the wafer temperature profile using a nonlinear feedback controller based on a distributed process model. A typical example of this class of problems is the control of titania aerosol reactors to achieve a nearly monodisperse particle-size distribution (Kalani and Christofides, 2000); this is required for titania pigments to obtain the maximum hiding powder per unit mass. Titania aerosol Control of Particle-Size Distributions.