Structural and Magnetization Properties of Island FePt Produced by Rapid Thermal Annealing
Structural and Magnetization Properties of Island FePt Produced by Rapid Thermal Annealing
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快速热退火制备的岛状 FePt 的结构和磁化性能
DOI：
10.1143/jjap.43.8040
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发表时间：
2004
影响因子：
1.5
通讯作者：
T. Katayama
中科院分区：
文献类型：
--
作者：
Y. Itoh;T. Aoyagi;A. Tsukamoto;K. Nakagawa;A. Itoh;T. Katayama
采用快速热退火（RTA）方法在热氧化的Si衬底上制备了FePt薄膜，得到了（001）取向的FePt/L10小晶粒。通过改变沉积态Pt/Fe层的总厚度，我们在RTA后获得了孤立的FePt/L10晶粒。最小的平均晶粒尺寸仅为7 nm的直径。这些沉积的Pt/Fe层是均匀的并且具有光滑的表面;然而，在RTA之后，发生内聚并且出现FePt/L10小的结晶颗粒。退火后，FePt颗粒嵌入SiO层中。薄膜在垂直于薄膜平面的方向上表现出高的矫顽力和高的剩磁比。FePt居里温度约为400°C。
We fabricated FePt films on thermal-oxidized Si substrate by rapid thermal annealing (RTA), and obtained (001)-oriented FePt/L10 small grains. By varying the total thickness of as-deposited Pt/Fe layers, we obtain isolated FePt/L10 crystalline grains after RTA. The smallest average grain size was only 7 nm in diameter. These as-deposited Pt/Fe layers were uniform and have a smooth surface; however after RTA, cohesion occurred and FePt/L10 small crystalline particles appeared. After annealing, the FePt grains are embedded in the SiO layer. The films showed high Hc and high remanence ratio in the direction perpendicular to the film plane. The FePt Curie temperature is appoximately 400°C.