Synthesis and properties of CO5.47N thin films by chemical solution deposition
Synthesis and properties of CO5.47N thin films by chemical solution deposition
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化学溶液沉积CO5.47N薄膜的合成及性能
DOI：
10.1016/j.matlet.2018.04.129
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发表时间：
2018
影响因子：
3
通讯作者：
Zhu Xuebin
中科院分区：
文献类型：
--
作者：
Zhang Li;Deng Yan;Yu Jiangying;Zhang Min;Huang Kai;Li Yibao;Li Ping;Zhu Xuebin
采用化学溶液沉积法在LaAlO3单晶衬底上制备Co5.47N薄膜。所得薄膜是纯相的多晶薄膜。研究了退火温度对微观结构、磁性和输运性能的影响。在800和900°C下退火的薄膜表现出致密的表面形貌，而1000°C的退火温度会导致去湿。所得Co5.47N薄膜具有铁磁性，居里温度高于632K，随着退火温度从800℃升高到1000℃，室温饱和磁化强度增强，矫顽力降低。与温度相关的电阻率表现出金属行为，并且随着退火温度的升高而降低。研究结果将为利用化学溶液沉积制备Co5.47N薄膜提供一条简便的途径。
Chemical solution deposition is used to prepare Co5.47N thin films on LaAlO3single crystal substrates. The derived thin films are phase-pure and polycrystalline. Annealing temperature effects on microstructures, magnetic and transport properties are investigated. The thin films annealed under 800 and 900 °C shows dense surface morphologies, whereas the 1000 °C annealing temperature will lead to dewetting. The derived Co5.47N thin films are ferromagnetic with Curie temperature higher than 632 K. The room-temperature saturation magnetization is enhanced and the coercivity is decreased with increasing the annealing temperature from 800 to 1000 °C. The temperature dependent resistivity shows metallic behaviors, and it is decreased with increasing the annealing temperature. The results will provide a facile route to prepare Co5.47N thin films using chemical solution deposition.