Effect of assist ion beam voltage on intrinsic stress and optical properties of Ta2O5 thin films deposited by dual ion beam sputtering
Effect of assist ion beam voltage on intrinsic stress and optical properties of Ta2O5 thin films deposited by dual ion beam sputtering
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DOI:
10.1016/j.tsf.2007.08.051
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发表时间:
2008-04
期刊:
影响因子:
2.1
通讯作者:
S. Yoon;Sung-Soo Kang;W. Jung;Sang‐Woo Kim;D. Yoon
中科院分区:
文献类型:
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作者:
S. Yoon;Sung-Soo Kang;W. Jung;Sang‐Woo Kim;D. Yoon