Responsivity of Ta-based STJ's to visible light as a function of Al trapping layer thickness

Responsivity of Ta-based STJ's to visible light as a function of Al trapping layer thickness
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Ta 基 STJ 对可见光的响应度与 Al 捕获层厚度的函数关系

DOI:
10.1016/j.nima.2003.11.303
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发表时间:
2004
影响因子:
1.4
通讯作者:
H. Ott
H. Ott
中科院分区:
物理与天体物理3区
文献类型:
--
作者:
I. Jerjen;E. Kirk;P. Lerch;A. Mchedlischivili;M. Furlan;Damian Twerenbold;A. Zehnder;H. Ott

文献摘要

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超导隧道结器件正被开发为能量分辨光子计数成像器。我们已经制作了一系列的Ta/Al/AlOx/Al/Ta器件与可变的Al层厚度,dAl,并测量其响应于弱可见光光子源。观察到单光子灵敏度。我们用一组修改的Rothwarf-Taylor方程,包括准粒子损耗,捕获,(背)隧穿和计算作为dAl的函数与一个拟合参数的电荷响应度来模拟我们的系统。在我们的器件中,Al和Ta的准粒子损耗时间分别为τl(Al)=35 μs和τl(Ta)=0.14 μs。
Superconducting tunneling junction devices are being developed as energy resolving photon counting imagers. We have fabricated a series of Ta/Al/AlOx/Al/Ta devices with variable Al layer thickness, dAl, and measured their response to a weak visible photon source. Single photon sensitivity is observed. We model our system with a set of modified Rothwarf–Taylor equations including quasiparticle losses, trapping, (back)tunneling and calculate the charge responsivity as a function of dAlwith one fitting parameter. The quasiparticle loss time for Al and Ta is found to be τl( Al )=35 μs and τl( Ta )=0.14 μs in our devices, respectively.