The role of low-energy electrons in focused electron beam induced deposition: four case studies of representative precursors
The role of low-energy electrons in focused electron beam induced deposition: four case studies of representative precursors
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DOI：
10.3762/bjnano.6.194
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发表时间：
2015-09-16
影响因子：
3.1
通讯作者：
Ingolfsson, Oddur
中科院分区：
文献类型：
--
作者：
Thorman, Rachel M.;Kumar, Ragesh T. P.;Ingolfsson, Oddur
聚焦电子束诱导沉积（FEBID）是一种单步直接写入纳米纤维技术，能够使用有机金属前体的电子诱导反应在表面上写入三维含金属的纳米级结构。然而，目前FEBID由于在初级电子束的区域之外的沉积而在分辨率方面受到限制，并且由于不完全的前体分解而在金属纯度方面受到限制。这两种限制可能部分是由前体分子与低能量（
Focused electron beam induced deposition (FEBID) is a single-step, direct-write nanofabrication technique capable of writing three-dimensional metal-containing nanoscale structures on surfaces using electron-induced reactions of organometallic precursors. Currently FEBID is, however, limited in resolution due to deposition outside the area of the primary electron beam and in metal purity due to incomplete precursor decomposition. Both limitations are likely in part caused by reactions of precursor molecules with low-energy (