Impacts of substrate bias and dilution gas on the properties of Si-doped diamond-like carbon films by plasma deposition using organosilane as a Si source
Impacts of substrate bias and dilution gas on the properties of Si-doped diamond-like carbon films by plasma deposition using organosilane as a Si source
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基底偏压和稀释气体对有机硅烷作为硅源等离子沉积硅掺杂类金刚石碳薄膜性能的影响
DOI：
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发表时间：
2016
期刊：
影响因子：
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通讯作者：
S. Miura
中科院分区：
文献类型：
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作者：
H. Nakazawa;S. Miura
