Plasma Process Uniformity Diagnosis Technique Using Optical Emission Spectroscopy With Spatially Resolved Ring Lens
Plasma Process Uniformity Diagnosis Technique Using Optical Emission Spectroscopy With Spatially Resolved Ring Lens
复制标题
空间分辨环形透镜发射光谱等离子体过程均匀性诊断技术
DOI：
10.1109/tie.2016.2571261
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发表时间：
2016
影响因子：
7.7
通讯作者：
I. Yun
中科院分区：
文献类型：
--
作者：
In Joong Kim;I. Yun
提出了一种利用空间分辨环形透镜(SRRL)的光学发射光谱(OES)测量位置等离子体强度的新方法。OES提供了一种非接触式、非破坏性的等离子体诊断工具，并且易于实施。尽管有这些优点，但局部区域的光强很难用光的叠加原理来测量。在这项研究中，通过阻挡通过SRRL中心的光通道，精确地测量了等离子体光的强度作为工艺室中距离的函数。这种方法改善了近光源的失真，并测量了局部光强。因此，它可以用来获得工艺室中的等离子体分布，从而评估等离子体过程的均匀性。
A novel method to measure the positional plasma intensity, which indicates the uniformity of plasma processes, using optical emission spectroscopy (OES) with a spatially resolved ring lens (SRRL) is proposed. OES offers a noncontact and nondestructive plasma diagnostic tool and is easily implemented. Despite these advantages, the light intensities in local regions are difficult to measure by the principle of superposition of light. In this study, by blocking the light passage through the center of the SRRL, the intensity of the plasma light as a function of the distance in the process chamber is measured precisely. This methodology improves the distortion of the near light source and measures the local light intensities. Thus, it can be used to obtain the plasma distribution in a process chamber and thereby assess the uniformity of the plasma process.