UV-NIL with working stamps made from Ormostamp
UV-NIL with working stamps made from Ormostamp
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DOI：
10.1016/j.mee.2008.11.020
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发表时间：
2009-04-01
影响因子：
2.3
通讯作者：
Schoeftner, R.
中科院分区：
文献类型：
--
作者：
Muehlberger, M.;Bergmair, I.;Schoeftner, R.
由于许多原因，如主印模的增加的寿命和通常更好的可制造性，将工作印模用于纳米压印光刻是非常令人感兴趣的。我们目前的结果上使用的Ormostamp作为材料的工作邮票在UV-NIL。研究了压印性能和防粘处理方法。到目前为止，可以实现50 nm的最小特征尺寸。(C)2008 Elsevier B. V.保留所有权利。
The use of working stamps for nanoimprint lithography is highly interesting for a number of reasons like an increased lifetime and often a better manufacturability of the master stamp. We present results on the use of Ormostamp as a material for working stamps in UV-NIL. Imprinting properties and anti-sticking treatments have been investigated. So far a minimum feature size of 50 nm can be achieved. (C) 2008 Elsevier B.V. All rights reserved.