The significance of self-annealing at room temperature in high purity copper processed by high-pressure torsion
The significance of self-annealing at room temperature in high purity copper processed by high-pressure torsion
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DOI：
10.1016/j.msea.2016.01.027
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发表时间：
2016-02-22
期刊：
影响因子：
6.4
通讯作者：
Langdon, Terence G.
中科院分区：
文献类型：
--
作者：
Huang, Yi;Sabbaghianrad, Shima;Langdon, Terence G.
在室温下通过高压扭转（HPT）处理高纯铜，然后在室温下储存长达6周的时间，以研究自退火的效果。在HPT处理后48小时和各种储存时间后记录硬度测量值。结果表明，通过1/2和1圈加工后，在盘的边缘附近发生恢复，这导致测量的硬度值显著下降，这伴随着异常晶粒生长的显微组织证据。相反，在加工5圈和10圈后，没有恢复，因此没有硬度下降。X射线线轮廓分析用于确定在HPT后1h和储存不同时间后的微晶尺寸和位错密度。结果表明，在经过超过1圈的HPT处理后，高纯度Cu具有良好的热稳定性，但当仅经过分数圈或非常小的圈数处理时，必须小心记录硬度测量值。(C)© 2016 Elsevier B. V.版权所有。
High purity copper was processed by high-pressure torsion (HPT) at room temperature and then stored at room temperature for periods of up to 6 weeks to investigate the effect of self-annealing. Hardness measurements were recorded both at 48 h after HPT processing and after various storage times. The results show the occurrence of recovery near the edges of the discs after processing through 1/2 and I turn and this leads to a significant drop in the measured hardness values which is accompanied by microstructural evidence for abnormal grain growth. Conversely, there was no recovery, and therefore no hardness drops, after processing through 5 and 10 turns. X-ray line profile analysis was used to determine the crystallite sizes and dislocation densities at 1 h after HPT and after storage for different times. The results show a good thermal stability in high purity Cu after processing through more than 1 turn of HPT but care must be exercised in recording hardness measurements when processing through only fractional or very small numbers of turns. (C) 2016 Elsevier B.V. All rights reserved.