Gold cleaning methods for electrochemical detection applications
Gold cleaning methods for electrochemical detection applications
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DOI：
10.1016/j.mee.2008.11.045
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发表时间：
2009-04-01
影响因子：
2.3
通讯作者：
Boisen, Anja
中科院分区：
文献类型：
--
作者：
Fischer, Lee M.;Tenje, Maria;Boisen, Anja
这项工作研究的方法，获得可靠的清洁金膜表面。九个黄金清洗方法在这里进行了研究：紫外线臭氧光反应器;氢氧化钾-过氧化氢;氢氧化钾电位扫描;硫酸过氧化氢;硫酸电位循环;盐酸电位循环;二甲胺硼烷还原剂溶液在25和65摄氏度;和稀形式的王水。峰电流电位差从循环伏安法和电荷转移电阻从电化学阻抗谱，以及X-射线光电子能谱获得用于表征表面清洁度。低的峰值电流电位差和电荷转移电阻表明表面更清洁，电极表面上元素金的百分比更高也是如此。氢氧化钾电位扫描法被发现留下的金表面最干净的整体。(C)2008 Elsevier B. V.保留所有权利。
This work investigates methods for obtaining reliably clean gold film surfaces. Nine gold cleaning methods are investigated here: UV ozone photoreactor; potassium hydroxide-hydrogen peroxide; potassium hydroxide potential sweep; sulfuric acid hydrogen peroxide; sulfuric acid potential cycling; hydrochloric acid potential cycling; dimethylamine borane reducing agent solutions at 25 and 65 degrees C; and a dilute form of Aqua Regia. Peak-current potential-differences obtained from cyclic voltammetry and charge transfer resistance obtained from electrochemical impedance spectroscopy, as well as X-ray photo-electron spectroscopy are used to characterize surface cleanliness. A low peak-current potential-difference and charge transfer resistance indicates a cleaner surface, as does a higher percentage of elemental gold on the electrode surface. The potassium hydroxide potential sweep method is found to leave the gold surface the cleanest overall. (C) 2008 Elsevier B.V. All rights reserved.