Optionality and locality: Evidence from Navajo sibilant harmony
Optionality and locality: Evidence from Navajo sibilant harmony
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选择性和局部性：来自纳瓦霍齿擦音和声的证据
DOI：
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发表时间：
2013
期刊：
影响因子：
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通讯作者：
Kelly Berkson
中科院分区：
文献类型：
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作者：
Kelly Berkson
虽然许多语音过程是局部的，但辅音和谐在语音上很有趣，因为它可以发生在非局部。纳瓦霍语中的齿擦音和谐要求单词中的齿擦音具有匹配的先行规范。该过程被描述为有时是强制性的，有时是可选的，但无论是可选设置中发生的统计性质还是促成可选性的因素都没有得到充分理解。本文使用第一人称所有格语素对这些问题进行了初步调查，该语素本质上是/ʃi-/，但可能与[si-]协调一致。实验 1 是一项在线语法判断调查，结果表明统一前缀在所有环境中都不受欢迎。实验 2 呈现了来自三个纳瓦霍语使用者的声学数据：虽然没有一个明显和谐，但前缀摩擦音的摩擦能量的频谱平均值和下限受到名词词干中 [+前] 齿擦音的影响。这些发现的总体含义是，和声不仅是可选的，而且对于某些说话者来说是不受欢迎的或完全不存在的。虽然研究了多种因素，但唯一持续影响和谐的因素是触发器和目标的邻近性，这表明虽然辅音和谐确实可能是一个非局部过程，但其发生在很大程度上是由距离调节的。凯利·哈珀·伯克森：印第安纳大学。电子邮件：keberkson@gmail.com
While many phonological processes are local, consonant harmony is of interest phonologically because it can occur non-locally. Sibilant harmony in Navajo requires that sibilants within a word have matching anteriority specifications. The process is described as being sometimes mandatory and sometimes optional, but neither the statistical nature of the occurrence in optional settings nor the factors contributing to the optionality are fully understood. This paper provides preliminary investigation into these issues using the first person possessive morpheme, which is underlyingly /ʃi-/ but may harmonize to [si-]. Experiment 1, an online grammaticality judgment survey, reveals that the harmonized prefix is dispreferred in all environments. Experiment 2 presents acoustic data from three Navajo speakers: though none harmonize overtly, the spectral mean and lower bound of frication energy of the prefixal fricative are affected by the presence of [+anterior] sibilants in noun stems. The overall implication of these findings is that harmony is not only optional but is dispreferred or wholly absent for some speakers. While multiple factors are investigated, the only one that consistently affects harmony is adjacency of the trigger and target, indicating that, although consonant harmony may indeed be a non-local process, its occurrence is heavily mediated by distance. Kelly Harper Berkson: Indiana University. E-mail: keberkson@gmail.com
影响因子：
2.4
作者：
Jongman, A;Wayland, R;Wong, S
通讯作者：
Wong, S