Characterization of MBE grown ZnO on GaAs(111) substrates

Characterization of MBE grown ZnO on GaAs(111) substrates
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GaAs(111) 基板上 MBE 生长 ZnO 的表征

DOI:
10.1002/pssc.200564645
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发表时间:
2006
期刊:
Physica Status Solidi (c)
影响因子:
--
通讯作者:
Takamasa Kato
Takamasa Kato
中科院分区:
--
文献类型:
--
作者:
T. Matsumoto;K. Nishimura;A. Nishii;A. Ota;Y. Nabetani;Takamasa Kato

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采用不同 O/Zn 通量比的等离子体辅助 MBE 在 GaAs(111)B 衬底上生长的 ZnO 外延层通过光致发光 (PL)、X 射线衍射 (XRD) θ –2θ 扫描、ω 扫描和倒易晶格映射进行表征。低温 PL 光谱以 3.360 eV 和 3.330 eV 处的束缚激子带为主。在富锌条件下生长的样品中 3.360 eV 谱带较强,而在富氧条件下生长的样品中 3.330 eV 谱带较强。外延取向关系为 ZnO(0001)//GaAs(111) 和 ZnO[11-20]//GaAs [01-1],与 O/Zn 通量比无关。 ZnO c轴相对于GaAs[111]轴向<1-10>或<2-1-1>方向倾斜0.2°~0.3°。 (© 2006 WILEY-VCH Verlag GmbH & Co. KGaA,魏因海姆)
ZnO epitaxial layers grown on GaAs(111)B substrates by plasma assisted MBE with different O/Zn flux ratios are characterized by photoluminescence (PL), X-ray diffraction (XRD) θ –2θ scan, ω scan, and reciprocal lattice mapping. Low temperature PL spectra are dominated by bound exciton bands at 3.360 eV and 3.330 eV. The 3.360 eV band is strong in samples grown under Zn-rich cindition and the 3.330 eV band is strong in samples grown under O-rich condition. The epitaxial orientation relationship is ZnO(0001)//GaAs(111) and ZnO[11-20]//GaAs [01-1] irrespective of the O/Zn flux ratio. The ZnO c-axis tilts by 0.2° ∼ 0.3° from the GaAs [111] axis toward 〈1-10〉 or 〈2-1-1〉 direction. (© 2006 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)
蓝宝石(0001)衬底上低压金属有机化学气相沉积ZnO薄膜的外延生长及其极性
DOI: --
发表时间: 2003
期刊: Jpn.J.Appl.Phys. 42
影响因子: --
作者:
Makoto Sugihara;et. al.;B.P.Zhang
通讯作者: B.P.Zhang