On-chip metal wire grid polarizer for CMOS image sensor based on 65-nm technology

On-chip metal wire grid polarizer for CMOS image sensor based on 65-nm technology
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DOI:
10.1364/cleo_si.2012.cm3m.7
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发表时间:
2012-05
期刊:
2012 Conference on Lasers and Electro-Optics (CLEO)
影响因子:
--
通讯作者:
K. Sasagawa;K. Ando;H. Matsuoka;T. Kobayashi;T. Noda;T. Tokuda;J. Ohta
K. Sasagawa;K. Ando;H. Matsuoka;T. Kobayashi;T. Noda;T. Tokuda;J. Ohta
中科院分区:
其他
文献类型:
--
作者:
K. Sasagawa;K. Ando;H. Matsuoka;T. Kobayashi;T. Noda;T. Tokuda;J. Ohta

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我们展示了互补金属氧化物半导体(CMOS)图像传感器像素与片上偏振片制造的标准65纳米CMOS技术。在750 nm波长处达到94的消光比。
We demonstrate complementary metal-oxide-semiconductor (CMOS) image sensor pixels with on-chip polarizer fabricated by a standard 65-nm CMOS technology. The extinction ratio of 94 at a wavelength of 750 nm was achieved.