Near-infrared free carrier absorption enhancement of heavily doped silicon in all-dielectric metasurface
Near-infrared free carrier absorption enhancement of heavily doped silicon in all-dielectric metasurface
复制标题
全电介质超表面中重掺杂硅的近红外自由载流子吸收增强
DOI:
10.1063/5.0023151
复制
发表时间:
2020-09-28
影响因子:
4
通讯作者:
Chen, Changhong
中科院分区:
文献类型:
--
作者:
Yu, Honghao;Xiong, Qing;Chen, Changhong
As the hole mobility increases with free carrier absorption (FCA), heavily doped p-type silicon has emerged as a promising candidate for detecting near-infrared (NIR) light with photonic energy below the semiconductor bandgap, and the hot-carrier photodetector is capable of high responsivity approaching commercially available devices. To enhance performance-related FCA of the semiconductor, here we demonstrate an all-silicon metasurface absorber designed in nanohole arrays and present an in-depth analysis on the electromagnetic resonance mechanism in the NIR spectral of interest. Multipole decomposition under a Cartesian coordinate system reveals that combining with the dielectric loss introduced by the doping, magnetic dipole resonances contribute predominantly to the absorption enhancement. This simple and easy-fabricated architecture has great potential for silicon hot-carrier photodetectors.