Growth rate of yttria-stabilized zirconia thin films formed by electrochemical vapour-deposition using NiO as an oxygen source: II. Effect of the porosity of NiO substrate
Growth rate of yttria-stabilized zirconia thin films formed by electrochemical vapour-deposition using NiO as an oxygen source: II. Effect of the porosity of NiO substrate
复制标题
使用NiO作为氧源通过电化学气相沉积形成的氧化钇稳定氧化锆薄膜的生长速率：II。
DOI：
10.1016/s0167-2738(97)00420-7
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发表时间：
1997
期刊：
影响因子：
--
通讯作者：
Z. Ogumi
中科院分区：
文献类型：
--
作者：
M. Inaba;A. Mineshige;Tomoyuki Maeda;Shinji Nakanishi;Tsutomu Ioroi;Tadayoshi Takahashi;A. Tasaka;K. Kikuchi;Z. Ogumi
