In situ and ex situ characterization of optical surfaces by light scattering techniques
In situ and ex situ characterization of optical surfaces by light scattering techniques
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通过光散射技术对光学表面进行原位和异位表征
DOI：
10.1117/1.oe.53.9.092013
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发表时间：
2014
期刊：
影响因子：
--
通讯作者：
N. Böwering
中科院分区：
文献类型：
--
作者：
M. Trost;T. Herffurth;S. Schröder;A. Duparré;M. Beier;S. Risse;A. Tünnermann;N. Böwering
抽象的。光学技术的不断发展以及对制造工艺的相应要求对计量提出了挑战性的要求。除了高灵敏度和强大的测量技术外，检测工具还应快速并能够表征大型和复杂形状的表面。这些方面可以通过基于光散射的表征技术来解决，由于非接触式数据采集，该技术还可以为测量条件提供很大的灵活性，因此不仅适用于非原位，而且适用于原位表征场景。应用实例范围从磁流变成品基板的粗糙度表征抛光极紫外镜基板直径超过600毫米的紧凑型以及实验室为基础的仪器。
Abstract. The continuous development of optical technologies and the accompanying requirements on the manufacturing process place challenging demands on metrology. In addition to highly sensitive and robust measurement techniques, the inspection tools should be fast and capable of characterizing large and complex-shaped surfaces. These aspects can be addressed by light-scattering-based characterization techniques, which also enable a large flexibility for the measurement conditions because of the noncontact data acquisition and are, thus, suited not only for ex situ but also in situ characterization scenarios. Application examples ranging from the roughness characterization of magneto-rheological finished substrates to polished extreme ultraviolet mirror substrates with diameters of more than 600 mm by compact as well as laboratory-based instruments are presented.