Thermal Stabilities of a Molecularly Stepped PMMA Substrate Prepared by Thermal Nanoimprinting and Isolated PMMA Chains Deposited on It Evaluated by High-Temperature Atomic Force Microscopy
Thermal Stabilities of a Molecularly Stepped PMMA Substrate Prepared by Thermal Nanoimprinting and Isolated PMMA Chains Deposited on It Evaluated by High-Temperature Atomic Force Microscopy
复制标题
通过高温原子力显微镜评估通过热纳米压印制备的分子阶梯式 PMMA 基板和沉积在其上的分离的 PMMA 链的热稳定性
DOI：
10.1038/s41428-021-00508-9
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发表时间：
2021
期刊：
影响因子：
--
通讯作者：
Jiro Kumaki
中科院分区：
文献类型：
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作者：
Ryota Umetsu;Jiro Kumaki
聚合物表面被认为具有高迁移率，并且这些表面的玻璃化转变温度（Tg）与本体相比显着降低。在这项研究中，我们通过热纳米压印具有原子级台阶蓝宝石基板的 PMMA 板和通过 Langmuir-Blodgett 技术沉积在其上的 PMMA 隔离链，制备了分子级台阶聚甲基丙烯酸甲酯 (PMMA) 基板。通过原位高温原子力显微镜，可以在分子水平上观察到阶梯高度约为0.2 nm的压印PMMA表面和沉积在其上的孤立的PMMA链，直至PMMA本体的Tg，这表明PMMA表面和沉积在其上的PMMA链具有接近本体PMMATg的热稳定性，并且没有观察到Tg的显着下降。压印 PMMA 基材和沉积的 PMMA 链表面的显着热稳定性是出乎意料的，并且与基于我们目前对聚合物表面的理解的结果不同。
Polymer surfaces are believed to have high mobility, and the glass transition temperature (Tg) of these surfaces is significantly decreased compared to that of the bulk. In this study, we prepared a molecularly stepped poly(methyl methacrylate) (PMMA) substrate by thermally nanoimprinting a PMMA plate with an atomically stepped sapphire substrate and PMMA isolated chains deposited on it by the Langmuir-Blodgett technique. The imprinted PMMA surface with a step height of ~0.2 nm and isolated PMMA chains deposited on it could be observed at the molecular level up to the PMMA bulkTgby in situ high-temperature atomic force microscopy, indicating that the PMMA surface and the PMMA chains deposited on it have thermal stability close to the bulk PMMATgand that no significant decrease inTgwas observed. The significant thermal stability of the surface of the imprinted PMMA substrate and deposited PMMA chains is unexpected and differs from the results based on our present understanding of the polymer surfaces.