In Situ Growth Monitoring During Metalorganic Chemical Vapor Deposition of YBa 2Cu 3Ox Thin Films by Spectroscopic Ellipsometry
In Situ Growth Monitoring During Metalorganic Chemical Vapor Deposition of YBa 2Cu 3Ox Thin Films by Spectroscopic Ellipsometry
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利用光谱椭圆光度法监测 YBa 2Cu 3Ox 薄膜金属有机化学气相沉积过程中的原位生长
DOI：
10.1143/jjap.38.l632
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发表时间：
1999
期刊：
影响因子：
--
通讯作者：
S. Oda
中科院分区：
文献类型：
--
作者：
Shuu'ichirou Yamamoto;S. Sugai;Y. Matsukawa;A. Sengoku;H. Tobisaka;T. Hattori;S. Oda
我们在原子层层金属有机化学气相沉积YBa2Cu3Ox(YBCO)薄膜的情况下进行了原位椭圆偏振光谱研究。我们从薄膜性质与沉积在钛酸锶衬底上的YBCO薄膜的伪介电函数轨迹之间的关系论证了光谱测量的有效性。我们还详细地演示了如何从4.1 eV左右的伪介电函数的虚部获得在生长初期形成的高质量晶体YBCO。在薄膜沉积过程中，可以通过光学测量来估计YBCO薄膜的超导电性。
We have investigated in situ spectroscopic ellipsometry in the case of atomic layer-by-layer metalorganic chemical vapor deposition of YBa2Cu3Ox (YBCO) thin films. We have demonstrated the effectiveness of spectroscopic measurement from the relationship between the film properties and trajectories of the pseudodielectric function of YBCO thin films deposited on SrTiO3 substrates. We have also demonstrated, in detail, how high-quality crystalline YBCO, formed in the initial growth stage, can be obtained from the imaginary part of the pseudodielectric function around 4.1 eV. Superconductivity of YBCO films can be estimated during film deposition using optical measurements.