Embedded nanostructures revealed in three dimensions
Embedded nanostructures revealed in three dimensions
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DOI：
10.1126/science.1116745
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发表时间：
2005-09-30
期刊：
影响因子：
56.9
通讯作者：
Midgley, PA
中科院分区：
文献类型：
--
作者：
Arslan, I;Yates, TJV;Midgley, PA
纳米技术为材料的表征带来了新的挑战，因为现在器件的性能不仅取决于传统的结构和组成参数，还取决于尺寸和形状。在这里，我们展示了扫描透射式电子显微镜中的Z-对比度层析成像已经被开发出来，以确定嵌入结构的完整的三维尺寸和形状，分辨率大约为1立方纳米。TiN/Si量子点体系的实验结果表明，该方法可以直接确定量子点的位置、大小、形状、结构和形成机理。这些方法适用于任何系统，提供了一个独特的、通用的三维可视化工具。
Nanotechnology creates a new challenge for materials characterization because device properties now depend on size and shape as much as they depend on the traditional parameters of structure and composition. Here we show that Z-contrast tomography in the scanning transmission electron microscope has been developed to determine the complete three-dimensional size and shape of embedded structures with a resolution of approximately 1 cubic nanometer. The results from a tin/silicon quantum dot system show that the positions of the quantum dots and their size, shape, structure, and formation mechanism can be determined directly. These methods are applicable to any system, providing a unique and versatile three-dimensional visualization tool.