HIGH RATE DEPOSITION OF DIAMOND-LIKE CARBON FILMS BY SHEET-LIKE PLASMA CHEMICAL VAPOR DEPOSITION
HIGH RATE DEPOSITION OF DIAMOND-LIKE CARBON FILMS BY SHEET-LIKE PLASMA CHEMICAL VAPOR DEPOSITION
复制标题
片状等离子体化学气相沉积法高速沉积类金刚石碳膜
DOI：
10.1116/1.581693
复制
发表时间：
1999
期刊：
影响因子：
--
通讯作者：
T. Wada
中科院分区：
文献类型：
--
作者：
R. Nonogaki;S. Yamada;T. Araki;T. Wada
在室温下，在高密度、广泛分布的片状等离子体下，沉积速率可达0.69 μm/min，形成了具有足够硬度和平整度的类金刚石（DLC）薄膜。利用直流电弧等离子体枪在磁场作用下产生氩等离子体，对送入沉积室的甲苯气体进行分解。在沉积过程中，为了提高薄膜的硬度，衬底被射频负偏置。采用拉曼光谱和红外吸收光谱对DLC薄膜进行了表征。利用光学发射光谱仪和四极杆质谱仪对等离子体中的自由基进行了鉴定。讨论了放电电流对薄膜性能的影响。
A high deposition rate of 0.69 μm/min was achieved in the formation of diamond-like carbon (DLC) film with sufficient hardness and flatness under a high density, widely spread sheet-like plasma at room temperature. The argon plasma was generated by a dc arc plasma gun under a magnetic field and it decomposed the toluene gas which was fed into the deposition chamber. During the deposition, the substrate was negatively biased by radio frequency (rf) in order to improve the hardness of the films. The DLC films were characterized by Raman and infrared absorption spectrometers. An optical emission spectrometer and a quadrupole mass spectrometer were used to identify the radicals in the plasma. The influence of the discharge current on the film properties is discussed.