Superhydrophobic surfaces fabricated by nanoimprint lithography
Superhydrophobic surfaces fabricated by nanoimprint lithography
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DOI：
10.1016/j.mee.2006.01.012
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发表时间：
2006-04-01
影响因子：
2.3
通讯作者：
Natali, Marco
中科院分区：
文献类型：
--
作者：
Pozzato, Alessandro;Dal Zilio, Simone;Natali, Marco
采用纳米压痕光刻和湿法化学刻蚀技术在硅表面制备了超疏水表面。玻璃模具被用来压印正向光致抗蚀剂层。通过UV-臭氧曝光和随后的光致抗蚀剂显影，去除了印记区域中的残留层。通过缓冲氢氟酸腐蚀将图案转移到薄的SiO_2层，然后通过各向同性氢氟硝酸(HNA)或各向异性KOH腐蚀将图案转移到硅上。用十八烷基三氯硅烷自组装单分子膜包裹样品后，测量了水滴的接触角，并与模型预测值进行了比较。(C)2006爱思唯尔B.V.保留所有权利。
Superhydrophobic surfaces were fabricated on silicon by nanoimprint lithography and wet chemical etching. Glass molds were used to imprint a positive photoresist layer. The residual layer in imprinted regions was removed by UV-ozone exposure and subsequent developing of the photoresist. The pattern is transferred to a thin SiO2 layer by buffered hydrofluoric acid etching and then to Si by isotropic hydrofluoric-nitric-acetic acid (HNA) or by anisotropic KOH etching. After coating the samples with a hydrophobic self-assembled monolayer of octadecyltriclorosilane contact angles of water drops were measured and compared to model predictions. (c) 2006 Elsevier B.V. All rights reserved.