SOLID SOLUBILITY OF NITROGEN IN AMORPHOUS CARBON FILMS DEPOSITED IN ELECTRON CYCLOTRON RESONANCE PLASMA
SOLID SOLUBILITY OF NITROGEN IN AMORPHOUS CARBON FILMS DEPOSITED IN ELECTRON CYCLOTRON RESONANCE PLASMA
复制标题
电子回旋共振等离子体沉积非晶碳膜中氮的固溶度
DOI：
10.1143/jjap.37.4983
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发表时间：
1998
影响因子：
1.5
通讯作者：
S. Ohshio
中科院分区：
文献类型：
--
作者：
H. Saitoh;Tohru Inoue;S. Ohshio
电子回旋共振等离子体用于形成含氮碳膜与CH 4 +N2气体混合物。为了加速来自等离子体室的阳离子，将射频诱导的负直流偏置电压施加到Si衬底。负偏压的增加对氮的注入是有效的，然而，在300 V下，氮分数在[N]/（[N]+[C]）=0.09处饱和。X射线光电子能谱的结果表明，膜具有C-N-C键或氮终止碳悬挂键。此外，离子加速导致G-带和D-带出现在IR光谱上，这通常会出现在从典型的类金刚石碳膜获得的拉曼光谱上。此外，含氮碳膜的硬度和最大杨氏模量与大多数类金刚石碳膜的硬度和最大杨氏模量相当。
Electron cyclotron resonance plasma is used in the formation of nitrogen-containing carbon films with a CH4+N2 gas mixture. To accelerate cations from the plasma room, rf-induced negative dc bias voltage is applied to the Si substrate. An increase in negative bias is effective for implantation of nitrogen, however, the nitrogen fraction saturates at [N]/([N]+[C])=0.09 at 300 V. The results of X-ray photoelectron spectroscopy suggests that the films have the C–N–C bond or nitrogen terminates the carbon dangling bond. In addition, ion acceleration causes a G-band and a D-band to appear on IR spectrum, which would normally appear on the Raman spectrum obtained from typical diamond-like carbon films. Furthermore, the hardness and maximum Young's modulus of nitrogen-containing carbon films are comparable to those of most diamond-like carbon films.