Electron irradiation of poly(olefin sulfones). Application to electron beam resists
Electron irradiation of poly(olefin sulfones). Application to electron beam resists
复制标题
聚（烯烃砜）的电子辐照。
DOI：
10.1002/app.1973.070171022
复制
发表时间：
1973
影响因子：
3
通讯作者：
L. F. Thompson
中科院分区：
文献类型：
--
作者：
M. Bowden;L. F. Thompson
所有的聚（烯烃砜）检查电子辐照下迅速降解。对于所有聚合物，实现与初始分布完全分离的分子量分布所需的剂量与分步溶液显影所需的剂量相似，即，1--2 x 10/sup-6/库仑/cm/sup 2/.这表明它们都具有相似的G值（断裂）。暴露区域的膜厚度以依赖于烯烃结构和温度的速率降低。这一过程被称为蒸气形成，归因于同时发生的断链和解聚。讨论了决定衰减速率的因素。（auth）
All the poly(olefin sulfones) examined degraded rapidly under electron irradiation. The dose required to effect a molecular weight distribution completely separated from the original distribution as required for fractional solution development was similar for all polymers, viz., 1--2 x 10/sup -6/ coulomb/cm/sup 2/. This indicates that they all have similar values for G(scission). The film thickness of the exposed area decreased at a rate dependent on olefin structure and temperature. This process, termed vapor development, has been attributed to concurrent chain scission and depolymerization. Factors determining the rate of depropagation are discussed. (auth)